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» Novel Polymers for thermal nanoimprint lithography with strongly improved release properties «

The new product series mr-I 7000R and mr-I 8000R developed by the NaPANIL partner micro resist technology GmbH, Berlin, Germany fills a gap on the nanoimprint lithography (NIL) resist market.

In the NIL process the mould release has to be defect-free and requires low release forces. The new polymer series mr-I 7000R and mr-I 8000R for thermal nanoimprinting fulfil these requirements better than any other material before.

Read more for figures and sample images. 

11 graduate students at DTU completed the course 33422 Nanolithography, taught by the NaPANIL partners DTU and Cognoscens in June 2010. 

In the final days of this term the students participated in the “Green Challenge” (Danish: Grøn Dyst) 

The poster “Advantages of Nanostructured Surfaces fabricated by NIL Technology” by DTU students Lisa Tschammer, Tanya Bakmand and Kim Jensen received a third prize in the category “graduate courses”, while Mette la Cour, Søren Fischer, Mohammed Al-Abaddi  and Kasper Frøhling were invited to present their poster project “Light Directional Elements fabricated by Nano Imprint Lithography” at the “Climate Community” at this year’s  Roskilde Festival.

Read more for details.